Congratulations on the utility model patents of "a unhairing device for leather processing", "a leveling device ±for leather products processing" and "a processing tensioning device for tan≈ning" of the company, which have been authorized by the China National Intelle±ctual Property Administration and obtained patent certificates.
A depilatory device for leather processing "provides a depilato>ry device for leather processing, belonging to the field of leather depilatory technology. The depi♠latory device for leather processing improves work efficiency, im±proves product quality, and enables leather to meet process ↕requirements.
A leveling device for leather product processing &q£uot;provides a leveling device for leather product processing, belo¶nging to the field of leather production technology. The leveliλng device used for leather product processing can level both l↔arge and small areas of leather products, improving work efficiency.
A processing tightening device for tanning "provides a tightening ↓device for leather product processing, belonging to the field of leather pr"oduction technology. This tightening device for tanning processing can clamp and tighten sheγepskin wool through a clamping mechanism. At the same time, the stability of the clamping♣ mechanism can be improved through a limit mechanism to prevent the clamping mech✔anism from falling off. The clamping mechanism can improve the clamping strengt<h of sheepskin wool through a stable mechanism, thereby improving φthe stability of sheepskin wool.
Up to now, the company has applied for 6 utility model patents, and has obtained 3 utility model patents authorized by the China National Intellectual Property Adminisσtration. The organization has applied for 5 invention patents, and has obtained 1 invention patent authorized by the China National Intellectual Property Administration. T<hese patent achievements have accumulated momentum for the company's future dεevelopment, further enhancing its core competitiveness, and providing strong technological support for future development.